Title: Conductive pad design modification for better wafer-pad contact
Abstract: An apparatus and method for manufacturing and refurbishing a conductive polishing pad assembly for performing an electrochemical process on a substrate is disclosed. The conductive polishing pad assembly is formed using a contact surface as a foundation that is coated with a metallic coating to create a conductive contact surface. In one embodiment, the metallic coating is a high purity tin/zinc alloy that is sprayed on the contact surface. The contact surface contains abrasive particles while the metallic coating provides at least conductive qualities to the contact surface.
Patent Number: 7,520,968 Issued on 04/21/2009 to Mavliev, et al.
| Inventors: |
Mavliev; Rashid A. (Campbell, CA), Karuppiah; Lakshmanan (San Jose, CA) |
| Assignee: |
Applied Materials, Inc.
(Santa Clara,
CA)
|
| Appl. No.:
|
11/243,488 |
| Filed:
|
October 4, 2005 |
Related U.S. Patent Documents
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| Application Number | Filing Date | Patent Number | Issue Date | |
| | 60616028 | Oct., 2004 | | | |
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| Current U.S. Class: |
204/279 ; 204/224M; 204/224R; 205/653; 205/662; 205/663; 451/533; 451/534; 451/539 |
| Current International Class: |
C25B 9/00 (20060101) |
| Field of Search: |
204/279,224M,224R 451/533,534,539 205/653,662,663
|
References Cited [Referenced By]
U.S. Patent Documents