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Design and layout of phase shifting photolithographic masks Number:7,435,513 from the United States Patent and Trademark Office (PTO) owispatent

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Title: Design and layout of phase shifting photolithographic masks

Abstract: A method for defining a full phase layout for defining a layer of material in an integrated circuit is described. The method can be used to define, arrange, and refine phase shifters to substantially define the layer using phase shifting. Through the process, computer readable definitions of an alternating aperture, dark field phase shift mask and of a complimentary mask are generated. Masks can be made from the definitions and then used to fabricate a layer of material in an integrated circuit. The separations between phase shifters, or cuts, are designed for easy mask manufacturability while also maximizing the amount of each feature defined by the phase shifting mask. Cost functions are used to describe the relative quality of phase assignments and to select higher quality phase assignments and reduce phase conflicts.

Patent Number: 7,435,513 Issued on 10/14/2008 to Cote,   et al.


Inventors: Cote; Michel L. (San Jose, CA), Pierrat; Christophe (Santa Clara, CA)
Assignee: Synopsys, Inc. (Mountain View, CA)
Appl. No.: 10/939,104
Filed: September 10, 2004


Related U.S. Patent Documents

Application NumberFiling DatePatent NumberIssue Date
10809650Mar., 20046861204
10085759Feb., 20026787271
09669359Sep., 20006503666
60215938Jul., 2000
60296788Jun., 2001
60304142Jul., 2001
60325689Sep., 2001

Current U.S. Class: 430/5
Current International Class: G03F 1/00 (20060101)
Field of Search: 430/5 716/19,21


References Cited [Referenced By]

U.S. Patent Documents
4037918 July 1977 Kato
4456371 June 1984 Lin
5246800 September 1993 Muray
5302477 April 1994 Dao et al.
5308741 May 1994 Kemp
5316878 May 1994 Saito et al.
5324600 June 1994 Jinbo et al.
5328807 July 1994 Tanaka et al.
5334542 August 1994 Saito et al.
5352550 October 1994 Okamoto
5364716 November 1994 Nakagawa et al.
5424154 June 1995 Borodovsky
5472814 December 1995 Lin
5480746 January 1996 Jinbo et al.
5496666 March 1996 Chu et al.
5498579 March 1996 Borodovsky et al.
5503951 April 1996 Flanders et al.
5523186 June 1996 Lin et al.
5527645 June 1996 Pati et al.
5532090 July 1996 Borodovsky
5537648 July 1996 Liebmann et al.
5538815 July 1996 Oi et al.
5539568 July 1996 Lin et al.
5565286 October 1996 Lin
5573890 November 1996 Spence
5595843 January 1997 Dao
5620816 April 1997 Dao
5635316 June 1997 Dao
5636131 June 1997 Liebmann et al.
5702847 December 1997 Tarumoto et al.
5702848 December 1997 Spence
5725969 March 1998 Lee
5761075 June 1998 Oi et al.
5766804 June 1998 Spence
5766806 June 1998 Spence
5807649 September 1998 Liebmann et al.
5811211 September 1998 Tanaka et al.
5827623 October 1998 Ishida et al.
5858580 January 1999 Wang et al.
5885734 March 1999 Pierrat et al.
5923562 July 1999 Liebmann et al.
5923566 July 1999 Galan et al.
5994002 November 1999 Matsuoka
5998068 December 1999 Matsuoka
6004701 December 1999 Uno et al.
6004702 December 1999 Lin
6010807 January 2000 Lin
6040892 March 2000 Pierrat
6057063 May 2000 Liebmann et al.
6066180 May 2000 Kim et al.
6077630 June 2000 Pierrat
6083275 July 2000 Heng et al.
6096458 August 2000 Hibbs
6130012 October 2000 May et al.
6139994 October 2000 Broeke et al.
6185727 February 2001 Liebmann
6228539 May 2001 Wang et al.
6251549 June 2001 Levenson
6258493 July 2001 Wang et al.
6335128 January 2002 Cobb et al.
6338922 January 2002 Liebmann et al.
6391501 May 2002 Ohnuma
6400838 June 2002 Watanabe
6420074 July 2002 Wang et al.
6436590 August 2002 Wang et al.
6518180 February 2003 Fukuda et al.
2001/0000240 April 2001 Wang et al.
2001/0028985 October 2001 Wang et al.
2002/0083410 June 2002 Wu et al.
2002/0122994 September 2002 Cote et al.
2002/0127479 September 2002 Pierrat
2002/0129327 September 2002 Pierrat et al.
2002/0136964 September 2002 Pierrat
2002/0142231 October 2002 Kling et al.
2002/0142232 October 2002 Kling et al.
2002/0144232 October 2002 Ma et al.
2002/0152454 October 2002 Cote et al.
2002/0155363 October 2002 Cote et al.
Foreign Patent Documents
195 45 163 Jun., 1996 DE
0 464 492 Jan., 1992 EP
0 653 679 May., 1995 EP
0 698 821 Feb., 1996 EP
2333613 Jul., 1999 GB
62067547 Mar., 1987 JP
2-140743 May., 1990 JP
7-111528 Feb., 1991 JP
1283925 Feb., 1991 JP
6-67403 Mar., 1994 JP
8-51068 Feb., 1996 JP
8051068 Feb., 1996 JP
8-236317 Sep., 1996 JP
2638561 Apr., 1997 JP
2650962 May., 1997 JP
10-133356 May., 1998 JP
10-326007 Aug., 1998 JP
11-143085 May., 1999 JP
11-212247 Jun., 1999 JP
2000-258892 Sep., 2000 JP
WO 98/12605 Mar., 1998 WO
0025181 May., 2000 WO
WO 01/23961 Apr., 2001 WO
WO 02/03140 Jan., 2002 WO
WO 02/073312 Sep., 2002 WO

Other References

Jinbo et al. "0.2um Or Less i-Line Lithography By Phase-Shifting Mask Technology" IEEE, pp. 33.3.1-33.3.4 (1990). cited by other .
Ackmann, P., et al., "Phase Shifting and Optical Proximity Corrections to Improve CD Control on Logic Devices in Manufacturing for Sub 0.35 um I-Line", SPIE, vol. 3051, pp. 146-153, Mar. 12-14, 1997. cited by other .
Matsuoka, K., et al., "Application of Alternating Phase-Shifting Mask to 0.16um CMOS Logic Gate Patterns", Matsushita Electric Ind. Co., Ltd. (9 pages), date unknown. cited by other .
Wang, R., et al., "Plarized Phase Shift Mask: Concept, Design, and Potential Advantages to Photolithography Process and Physical Design", Motorola Semiconductor Product Sector (12 pages), date unknown. cited by other .
Ogawa, K., et al., "Phase Defect Inspection by Differential Interference", Lasertec Corporation (12 pages), date unknown. cited by other .
Pistor, T., "Rigorous 3D Simulation of Phase Defects in Alternating Phase-Shifting Masks", Panoramic Technology Inc. (13 pages), date unknown. cited by other .
Semmier, A., et al., "Application of 3D EMF Simulation for Development and Optimization of Alternating Phase Shifting Masks", Infineon Technologies AG (12 pages), date unknown. cited by other .
Wong, A., et al., "Polarization Effects in Mask Transmission", University of California Berkeley (8 pages), date unknown. cited by other .
Erdmann, A., "Topography Effects and Wave Aberrations in Advanced PSM-Technology", Fraunhofer Institute of Integrated Circuits (11 pages), date unknown. cited by other .
Granik, Y., et al., "CD Variation Analysis Technique and its Application to the Study of PSM Mask Misalignment", Mentor Graphics (9 pages), date unknown. cited by other .
Hanyu, et al., "New Phase-Shifting Mask with Highly Transparent SiO2 Phase Shifters", Fujitsu Laboratories Ltd. (11 pages), date unknown. cited by other .
Ishiwata, N., et al., "Fabrication of Phase-Shifting Mask", Fujitsu Limited (11 pages), date unknown. cited by other .
Levenson, M., et al., "Phase Phirst! An Improved Strong-PSM Paradigm", M.D. Levenson Consulting, Petersen Advanced Lithography, KLA-Tencor (10 pages), date unknown. cited by other .
Levenson, M., et al., "SCAA Mask Exposures and Phase Phirst Design for 110nm and Below", M.D. Levenson Consulting, Canon USA, Inc., JSR Microelectronics, Inc. (10 pages), date unknown. cited by other .
Lin, B.J., "The Relative Importance of the Building Blocks for 193nm Optical Lithography", Linnovation, Inc. (12 pages), date unknown. cited by other .
McCallum, M., et al., "Alternating PSM Mask Performance--a Study of Multiple Fabrication Technique Results", International SEMATECH (6 pages), date unknown. cited by other .
Morikawa, Y., et al., "100nm-alt.PSM Structure Discussion for ArF Lithography", Dai-Nippon Printing Co., Ltd. (15 pages), date unknown. cited by other .
Ozaki, T., et al., "A 0.15um KrF Lithography for 1Gb DRAM Product Using Highly Printable Patterns and Thin Resist Process", Toshiba Corporation (2 pages), date unknown. cited by other .
Rhyins, P., et al., "Charaterization of Quartz Etched PSM Masks for KrF Lithography at the 100nm Node", Photronics, Inc., MIT Lincoln Lab, ARCH Chemicals, Finle Technologies, KLATencor Corp. (10 pages), date unknown. cited by other .
Rosenbluth, A., et al., "Optimum Mask and Source Patterns to Print a Given Shape", IBM (17 pages), date unknown. cited by other .
Schmidt, R., et al., "Impact of Coma on CD Control for Multiphase PSM Designs", AMD, ASML (10 pages), date unknown. cited by other .
Sewell, H., et al., "An Evaluation of the Dual Exposure Technique", SVG Lithography Systems Inc. (11 pages), date unknown. cited by other .
Spence, C., et al., "Optimization of Phase-Shift Mask Designs Including Defocus Effects", AMD, Princeton University, Vecor Technologies Inc. (8 pages), date unknown. cited by other .
Suzuki, A., et al., "Multilevel Imaging System Realizing k1=-.3 Lithogrpahy", Canon Inc. (13 pages), date unknown. cited by other .
Vandenberghe, G., et al., "(Sub-)100nm Gate Patterning Using 248nm Alternating PSM", IMEC, Mentor Graphics (9 pages), date unknown. cited by other .
Fritze, M., et al., "100-nm Node Lithography with KrF?", MIT Lincoln Lab, Numberical Technologies, Photronics, Arch Chemicals (14 pages), date unknown. cited by other .
Fukuda, H., et al., "Patterning of Random Interconnect Using Double Exposure of Strong-Type PSMs", Hitachi Central Research Lab (8 pages), date unknown. cited by other .
Ferguson, R., et al., "Pattern-Dependent Correction of Mask Topography Effects for Alternating Phase-Shifting Masks", IBM Microelectronics, University of California Berkeley (12 pages), date unknown. cited by other .
Toublan, O., et al., "Phase and Transmission Errors Aware OPC Solution for PSM: Feasibility Demonstration", Mentor Graphics Corp. (7 pages), date unknown. cited by other .
Yanagishita, Y., et al., "Phase-Shifting Photolithography Applicable to Real IC Patterns", Fujitsu Limited (11 pages), date unknown. cited by other .
Levenson, M., et al., "Improving Resolution in Photolithography with a Phase-Shifting Mask", IEEE, Transactions On Electron Devices, vol. ED-29, No. 12, pp. 1828-1836, Dec. 1982. cited by other .
Levenson, M., et al., "The Phase-Shifting Mask II: Imaging Simulations and Submicrometer Resist Exposures", IEEE Transactions on Electron Devices, vol. ED-31, No. 6, pp. 753-763, Jun. 1984. cited by other .
Terasawa, T., et al., "0.3-Micron Optical Lithography Using a Phase-Shifting Mask", SPIE, Optical/Laser Microlithography II, vol. 1088, pp. 25-33, Mar. 1989. cited by other .
Nitayama, A., et al., "New Phase Shifting Mask with Self-Aligned Phase Sifters for a Quarter Micron Photolithography", IEDM, pp. 3.3.1-3.3.4, Dec. 3-6, 1989. cited by other .
Jinbo, H., et al., "0.2um or Less i-Line Lithography by Phase-Shifting-Mask Technology", IEEE, pp. 33.3.1-33.3.4 (1990). cited by other .
Neureuther, A., "Modeling Phase Shifting Masks", SPIE, 10th Annual Symposium On Microlithography, vol. 1496, pp. 80-85 (1990). cited by other .
Yamanaka, T., et al., "A 5.9um2 Super Low Power SRAM Cell Using a New Phase-Shift Lithography", IEDM, pp. 18.3.1-18.3.4 (1990). cited by other .
Inokuchi, K., et al., "Sub-Quarter Micron Gate Fabrication Process Using Phase-Shifting-Mask for Microwave GaAs Devices", Extended Abstracts Of The 1991 Intl. Conference On Solid State Devices And Materials, Yokohama, Japan, pp. 92-94 (1991). cited by other .
Inokuchi, K., et al., "Sub-Quarter-Micron Gate Fabrication Process Using Phase-Shifting Mask for Microwave GaAs Devices", Japanese Journal Of Applied Physics, vol. 30, No. 12B, pp. 3818-3821, Dec. 1991. cited by other .
Jinbo, H., et al., "Improvement of Phase-Shifter Edge Line Mask Method", Japanese Journal Of Applied Physics, vol. 30, No. 11B, pp. 2998-3003, Nov. 1991. cited by other .
Kimura, T., et al., "Subhalf-Micron Gate GaAs Mesfet Process Using Phase-Shifting-Mask Technology", IEEE, GaAs IC Symposium, pp. 281-284 (1991). cited by other .
Wiley, J., et al., "Phase Shift Mask Pattern Accuracy Requirements and Inspection Technology", SPIE, Integrated Circuit Metrology, Inspection, And Process Control V, vol. 1464, pp. 346-355 (1991). cited by other .
Hirai, Y., et al., "Automatic Pattern Generation System for Phase Shfiting Mask", 1991 Symposium on VLSI Technology, Digest of Technical Papers, pp. 95-96, May 28-30, 1991. cited by other .
Wong, A., et al., "Investigating Phase-Shifting Mask Layout Issues Using a Cad Toolkit", IEEE, pp. 27.4.1-27.4.4 (1991). cited by other .
Terasawa, T., et al., "Imaging Characteristics of Multi-Phase-Shifting and Halftone Phase-Shifting Masks", Japanese Journal of Applied Physics, vol. 30, No. 11B, pp. 2991-2997, Nov. 1991. cited by other .
Burggraaf, P., "Four More Significant Japanese Advances in Phase Shfiting Technology", Semiconductor International, p. 16, Dec. 1991. cited by other .
Kemp, K., et al., "Optimized Phase Shift Mask Designs for Real Devices", KTI Microlithography Seminar, pp. 67-75, Oct. 14-15, 1991. cited by other .
Newmark, D., et al., "Phase-Shifting Mask Design Tool", SPIE--11th Annual BACUS Symposium on Photmask Technology, vol. 1604, pp. 226-235, Sep. 25-27, 1991. cited by other .
Nolscher, C., et al., "Investigation of Self-Aligned Phase-Shifting Reticles by Simulation Techniques", SPIE--Optical/Laser Microlithography IV, vol. 1463, pp. 135-150 (1991). cited by other .
Inoue, S., et al., "Simulation Study on Plase-Shifting Masks for Isolated Patterns", Japanese Journal of Applied Physics, vol. 30, No. 11B, pp. 3010-3015, Nov. 1991. cited by other .
Watanabe, H., et al., "Detection and Printability of Shifter Defects in Phase-Shifting Masks", Japanese Journal of Applied Physics, vol. 30, No. 11B, pp. 3016-3020, Nov. 1991. cited by other .
Watanabe, H., et al., "Pattern Transfer Characteristics of Transparent Phase Shifting Mask", Japanese Journal of Applied Physics, vol. 30, No. 11B, pp. 3004-3009, Nov. 1991. cited by other .
Jinbo, H., et al., "Application of Blind Method to Phase-Shifting Lithography", IEEE, 1992 Symposium On VLSI Technology Digest Of Technical Papers, pp. 112-113 (1992). cited by other .
Watanabe, H., et al., "Detection and Printability of Shifter Defects in Phase-Shifting Masks II Defocus Characteristics", Jpn. J. Appl. Phys., vol. 31, pp. 4155-4160 (1992). cited by other .
Pierrat, C., et al., "Phase-Shifting Mask Topography Effects on Lithographic Image Quality", IEEE, pp. 3.3.1-3.3.4 (1992). cited by other .
Burggraaf, P., "Lithography's Leading Edge, Part 1: Phase-Shift Technology and Part 2: I-Line and Beyond", Semiconductor International, pp. 43-47 and 52-56, Feb. 1992. cited by other .
IBM, "Phase-Shift Mask Utilizing Silicon Oxy-Nitride as a Low Reflectivity Phase-Shift Layer", IBM Technical Disclosure Bulletin, vol. 34, No. 10B, pp. 360-361, Mar. 1992. cited by other .
Brunner, T., et al., "170nm Gates Fabricated by Phase-Shift Mask and Top Anti-Reflector Process", SPIE, Optical/Laser Microlithography VI, Vo. 1927, pp. 182-189 (1993). cited by other .
Lin, B.J., "Phase-Shifting Masks Gain an Edge", IEEE Circuits & Devices, pp. 28-35, Mar. 1993. cited by other .
Moniwa, A., et al., "Algorithm for Phase-Shift Mask Design with Priority on Shifter Placement", Jpn. J. Appl. Phys., vol. 32, Pt. 1, No. 12B, pp. 5874-5879, Dec. 1193. cited by other .
Ooi, K., et al., "Computer Aided Design Software for Designing Phase-Shifting Masks", Jpn. J. Appl. Phys., vol. 32, Pt. 1, No. 12B, pp. 5887-5891, Dec. 1993. cited by other .
Ohtsuka, H., et al., "Evaluation of Repair Phase and Size Tolerance for a Phase-Shift Mask", J. Vac. Sci. Technol. B, vol. 11, No. 6, pp. 2665-2668, Nov./Dec. 1993. cited by other .
Ronse, K., et al., "Comparison of Various Phase Shift Strategies and Application to 0.35um ASIC Designs", SPIE--Optical/Laser Microlithography VI, vol. 1927, pp. 2-16 (1993). cited by other .
Galan, G., et al., "Application of Alternating-Type Phase Shift Mask to Polysilicon Level for Random Logic Circuits", Jpn. J. Appl. Phys., vol. 33, pp. 6779-6784 (1994). cited by other .
Mizuno, F., et al., "Practical Phase-Shifting Mask Technology for 0.3um Large Scale Integrations", J. Vac. Sci. Technol. B, vol. 12, No. 6, pp. 3799-3803, Nov./Dec. 1994. cited by other .
Pati, Y.C., et al., "Phase-Shifting Masks for Microlithography: Automated Design and Mask Requirements", J. Opt. Soc. Am., vol. 11, No. 9, pp. 2438-2452, Sep. 1994. cited by other .
Stirniman, J., et al., "Wafer Proximity Correction and Its Impact on Mask-Making", Bacus News, vol. 10, Issue 1, pp. 1, 3-7, 10-12, Jan. 1994. cited by other .
Waas, T., et al., "Automatic Generation of Phase Shift Mask Layouts", Microelectronic Engineering, vol. 23, pp. 139-142 (1994). cited by other .
Barouch, E., et al., "Optimask: An OPC Algorithm for Chrome and Phase-Shift Mask Design", SPIE, Vo. 2440, pp. 192-206, Feb. 1995. cited by other .
Moniwa, A., et al., "Heuristic Method for Phase-Conflict Minimization in Automatic Phase-Shift Mask Design", Jpn. J. Appl. Phys., vol. 34, Pt. 1, No. 12B, pp. 6584-6589, Dec. 1995. cited by other .
Langston, J., et al., "Extending Optical Lithography to 0.25um and Below", Solid State Technology, pp. 57-64, Mar. 1995. cited by other .
Nagahiro, Y., "Improved Mask Technique for Photolithography Applied to 0.25um LSI--Improvement of Resolution, Pattern Correction, Exposure Area", Nikkei Microdevices, pp. 1-6, Apr. 1995. cited by other .
Okamoto, Y., et al., "A New Phase Shifting Mask Technology for Quarter Micron Photolithography", SPIE, vol. 2512, pp. 311-318 (1995). cited by other .
Pierrat, C., et al., "Required Optical Characteristics of Materials for Phase-Shifting Masks", Applied Optics, vol. 34, No. 22, pp. 4923-4928, Aug. 1, 1995. cited by other .
Galan, G., et al., "Alternating Phase Shift Generation for Coplex Circuit Designs", SPIE, vol. 2884, pp. 508-519, Sep. 18-20, 1996. cited by other .
Kanai, H., et al., "Sub-Quarter Micron Lithography with the Dual-Trench Type Alternating PSM", SPIE, vol. 2793, pp. 165-173 (1996). cited by other .
Ishiwata, N., et al., "Novel Alternating Phase Shift Mask with Improved Phase Accuracy", SPIE, Proceedings Of The 17th Annual Symposium On Photomask Technology And Management, vol. 3236, pp. 243-249 (1997). cited by other .
Morimoto, H., et al., "Next Generation Mask Strategy--Technologies are Ready for Mass Production of 256MDRAM?", SPIE, vol. 3236, pp. 188-189 (1997). cited by other .
Roman, B., et al., "Implications of Device Processing on Photomask CD Requirements", SPIE, vol. 3236 (1997) (Abstract Only). cited by other .
Nakae, A., et al., "A Proposal for Pattern Layout Rule in Application of Alternating Phase Shift Mask", SPIE, vol. 3096, pp. 362-374 (1997). cited by other .
Tsujimoto, E., et al., "Hierarchical Mask Data Design System (Prophet) for Aerial Image Simulation, Automatic Phase-Shifter Placement, and Subpeak Overlap Checking", SPIE, vol. 3096, pp. 163-172 (1997). cited by other .
Yamamoto, K., et al., "Hierarchical Processing of Levenson-Type Phase Shifter Generation", Jpn. J. Appl. Phys., vol. 36, Part 1, No. 12B, pp. 7499-7503, Dec. 1997. cited by other .
Gordon, R., et al., "Design and Analysis of Manufacturable Alternating Phase-Shifting Masks", Bacus News, vol. 14, Issue 12, pp. 1-9, Dec. 1998. cited by other .
Nara, M., et al., "Phase Controllability Improvement for Alternating Phase Shift Mask", Dai Nippon Printing Co., Ltd. (16 pages), 1997. cited by other .
Ohnuma, H., et al., "Lithography Computer Aided Design Technology for Embedded Memory in Logic", Jpn. J. Appl. Phys., vol. 37, Part I, No. 12B, pp. 6686-6688, Dec. 1998. cited by other .
Fukuda, H., "Node-Connection/Quantum Phase-Shifting Mask: Path to Below 0.3um Pitch, Proximity Effect Free, Random Interconnects and Memory Patterning", J. Vac. Sci. Technol. B, vol. 17, No. 6, pp. 3291-3295, Nov./Dec. 1999. cited by other .
Spence, C., et al., "Integration of Optical Proximity Correction Strategies in Strong Phase Shifters Design for Poly-Gate Layers", Bacus News, vol. 15, Issue 12, pp. 1, 4-13, Dec. 1999. cited by other .
Kuo, C., et al., "Extension of Deep-Ultraviolet Lithography for Patterning Logic Gates Using Alternating Phase Shifting Masks", J. Vac. Sci. Technol. B, vol. 17, No. 6, pp. 3296-3300, Nov./Dec. 1999. cited by other .
Palmer, S., et al., "Dual Mask Model-Based Proximity Correction for High Performance 0.10um CMOS Process", The 44th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Abstracts, pp. 18-19, May 30-Jun. 1999. cited by other .
Pierrat, C., "Investigation of Proximity Effects in Alternating Aperture Phase Shifting Masks", Numerical Technologies, Inc. (11 pages), 2000. cited by other .
Kikuchi, K., et al., "Method of Expanding Process Window for the Double Exposure Technique with alt-PSMs", Optical Microlithography XIII, Proceeding of SPIE, vol. 4000, pp. 121-131 (2000). cited by other .
Cote, M., et al., "A Practical Application of Full-Feature Alternating Phase-Shifting Technology for a Phase-Aware Standard-Cell Design Flow", Numerical Technologies Inc. (6 pages), 2000. cited by other .
Heng, F., et al., "Application of Automated Design Migration to Alternating Phase Sifht Mask Design", IBM Research Report RC 21978 (98769), Feb. 26, 2001 (7 pages). cited by other .
Wong, A., et al., "Alternating Phase-Shifting Mask with Reduced Aberration Sensitivity: Lithography Considerations", Proc. SPIE, vol. 4346, pp. 1-9 (2001). cited by other .
Schmidt, R., et al., "Impact of Coma on CD Control for Multiphase PSM Designs", AMD, ASML (11 pages), date unknown. cited by other .
Ozaki, T., et al., "A 0.15um KrF Lithography for 1 Gb DRAM Product Using Highly Printable Patterns and Thin Resist Process", Toshiba Corporation (2 pages), date unknown. cited by other .
Rhyins, P., et al., "Characterization of Quartz Etched PSM Masks for KrF Lithography at the 100nm Node", Photronics, Inc., MIT Lincoln Lab, ARCH Chemicals, Finle Technologies, KLATencor Corp. (10 pages), date unknown. cited by other .
Ronse, K., et al., "Thin Film Interference Effects in Phase Shifting Masks Causing Phase and Transmittance Errors", IMEC (15 pages), date unknown. cited by other .
Sakata, M., et al., "A Novel Radiation Sensitive Spin-on-Glass Convertible into SiO2 and the Simple Fabrication Process Using It", Oki Electric Industry Co. Ltd. (3 pages), date unknown. cited by other .
IBM, "Method to Produce Sizes in Openings in Photo Images Smaller Than Lithographic Minimum Size", IBM Technical Disclosure Bulletin, vol. 29, No. 3, p. 1328, Aug. 1986. cited by other .
Buraschi, M., et al., "Optical-Diffraction-Based Modulation of Photoresist Profile or Microlithography Applications", Optical Engineering, vol. 28, No. 6, pp. 654-658, Jun. 1989. cited by other .
Toh, K., et al., "Chromeless Phase-Shifted Masks: A New Approach to Phase-Shifting Masks", BACUS--Tenth Annual Symposium on Microlithography, Sep. 1990 (27 pages). cited by other .
Nakagawa, K., et al., "Fabrication of 64m DRAM with 1-Line Phase-Shift Lithography", IEDM, pp. 33.1.1-33.1.4 (1990). cited by other .
Watanabe, H., et al., "Transparent Phase Shifting Mask", IEDM, pp. 33.2.1-33.2.4 (1990). cited by other .
Burggraaf, P., "Four More Significant Japanese Advances in Phase Shifting Technology", Semiconductor International, p. 16, Dec. 1991. cited by other .
Hosono,.K., et al., "A Novel Architecture for High Speed Dual Image Generation of Pattern Data for Phase Shifting Reticle Inspection", SPIE--Integrated Circuit Metrology, Inspection, and Process Control VI, vol. 1673, pp. 229-235 (1992). cited by other .
Brunner, T., "Rim Phase-Shift Mask Combined with Off-Axis Illumination: A Path to 0.5(lampda) / Numerical Aperture Geometries", Optical Engineering, vol. 32, No. 10, pp. 2337-2343, Oct. 1993. cited by other .
Troccolo, P., et al., "Interferometric Measurement of Etch Depths in Phase Shift Masks", BACUS News, vol. 9, Issue 6, pp. 1 & 4-6, Jun. 1993. cited by other .
Watanabe, H., et al., "Phase-Shifting Lithography: Maskmaking and its Application", J. Vac. Sci. Technol. B, vol. 11, No. 6, pp. 2669-2674, Nov./Dec. 1993. cited by other .
Ishida, S., et al., "Large Assist Feature Phase-Shift Mask for Sub-Quarter Micrometer Window Pattern Formation", SPIE, vol. 3096, pp. 333-343 (1997). cited by other .
Nara, M., et al., "Phase Controllability Improvement for Alternating Phase Shift Mask", Dai Nippon Printing Co., Ltd. (16 pages), date unknown. cited by other .
Petersen, J., et al., "Designing Dual-Trench Alternating Phase-Shift Masks for 140nm and Smaller Features Using 248-nm KrF and 193-nm ArF Lithography", Bacus News, vol. 14, Issue 8, pp. 1 & 4-13, Aug. 1998. cited by other .
Palmer, S., et al., "Dual Mask Model-Based Proximity Correction for High Performance 0.10um CMOS Process", The 44th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication Abstracts, pp. 18-19, May 30-Jun. 2, 2000. cited by other .
Piotr Berman et al. "Optimal Phase Conflict Removal for Layout of Dark Field Alternating Phase Shifting Masks" IEEE Transactions on Computer Aided Design of Integrated Circuits and Systems vol. 19, No. 2 Feb. 2000, pp. 175-187. cited by other .
Andrew B. Kahng et al. "New Graph Bipartizations for Double-Exposure, Bright Field Alternating Phase-Shift Mask Layout" Proceedings of the ASP-DAC 2001, Asia and South Pacific Design Automation Conference 2001, pp. 133-138. cited by other .
Cooke, M., "OPC/PSM Designs For Poly Gate Layers", European Semiconductor, vol. 22, No. 7, pp. 57-59, Jul. 2000. cited by other .
Granik, Y., et al., "Sub-Resolution Process Windows And Yield Estimation Technique Based On Detailed Full-Chip CD Simulation", SPIE, vol. 4182, pp. 335-341 (2000). cited by other .
Plat, M., et al., "The Impact of Optical Enhancement Techniques on the Mask Error Enhancement Funchtion (MEEF)", SPIE, vol. 4000, pp. 206-214, Mar. 1-3, 2000. cited by other .
Mansuripur, M., et al., "Projection Photolithography", Optics & Photonics News 11, 17 pages, Feb. 2000. cited by other .
Hirai, Y., et al., "Automatic Pattern Generation System for Phase Shifting Mask", 1991 Symposium on VLSI Technology, Digest of Technical Papers, pp. 95-96, May 28-30, 1991. cited by other .
Inoue, S., et al., "Simulation Study on Phase-Shifting Masks for Isolated Patterns", Japanese Journal of Applied Physics, vol. 30, No. 11B, pp. 3010-3015, Nov. 1991. cited by other .
U.S. Appl. No. 09/917,581, filed Jul. 27, 2001 entitled Method and Apparatus for Allowing Phase Conflicts In Phase Shifting Mask and Chromeless Phase Edges, inventor Hua-Yu Liu. cited by other .
Ackmann, P. et al., "Phase Shifting And Optical Proximity Corrections To Improve CD Control On Logic Devices In Manufacturing For Sub 0.35 .mu.m I-Line", Advance Micro Devices (8 pages), date unknown. cited by other .
Asai, S. et al., "High Performance Optical Lithography Using A Separated Light Source", J. Vac. Sci. Technol. B, vol. 10, No. 6, pp. 3023-3026, Nov./Dec. 1992. cited by other .
Barouch, E. et al., "Optimask: An OPC Algorithm For Chrome And Phase-Shift Mask Design", SPIE, vol. 2440, pp. 192-206, Feb. 1995. cited by other .
Brunner, T. et al., "170nm Gates Fabricated By Phase-Shift Mask And Top Anti-Reflector Process", SPIE, Optical/Laser Microlithography VI, vol. 1927, pp. 182-189 (1993). cited by other .
Brunner, T. et al., "Approximate Models For Resist Processing Effects", SPIE, vol. 2726, pp. 198-207, Mar. 1996. cited by other .
Fukuda, H. et al., "Determination Of High-Order Lens Aberration Using Phase/Amplitude Linear Algebra", J. Vac. Sci. Technol. B, vol. 17, No. 6, pp. 3318-3321, Nov./Dec. 1999. cited by other .
Inokuchi, K. et al., "Sub-Quarter Micron Gate Fabrication Process Using Phase-Shifting-Mask For Microwave GaAs Devices", Extended Abstracts of the 1991 Intl. Conference on Solid State Devices and Materials, Yokohama, Japan, pp. 92-94 (1991). cited by other .
Inokuchi, K. et al., "Sub-Quarter-Micron Gate Fabrication Process Using Phase-Shifting Mask For Microwave GaAs Devices", Japanese Journal of Applied Physics, vol. 30, No. 12B, pp. 3818-3821, Dec. 1991. cited by other .
Ishiwata, N. et al., "Novel Alternating Phase Shift Mask With Improved Phase Accuracy", SPIE, Proceedings of the 17.sup.th Annual Symposium on Photomask Technology and Management, vol. 3236, pp. 243-249 (1997). cited by other .
Jinbo, H. et al., "0.2 .mu.m Or Less i-Line Lithography By Phase-Shifting-Mask Technology", IEEE, pp. 33.3.1-33.3.4 (1990). cited by other .
Jinbo, H. et al., "Application Of Blind Method To Phase-Shifting Lithography", IEEE, 1992 Symposium on VLSI Technology Digest of Technical Papers, pp. 112-113 (1992). cited by other .
Jinbo, H. et al., "Improvement Of Phase-Shifter Edge Line Mask Method", Japanese Journal of Applied Physics, vol. 30, No. 11B, pp. 2998-3003, Nov. 1991. cited by other .
Karklin, L., "A Comprehensive Simulation Study Of The Photomask Defects Printability", SPIE, vol. 2621, pp. 490-504 (1995). cited by other .
Kimura, T. et al., "Subhalf-Micron Gate GaAs Mesfet Process Using Phase-Shifting-Mask Technology", IEEE, GaAs IC Symposium, pp. 281-284 (1991). cited by other .
Levenson, M. et al., "Improving Resolution In Photolithography With A Phase-Shifting Mask", IEEE Transactions on Electron Devices, vol. ED-29, No. 12, pp. 1828-1836, Dec. 1982. cited by other .
Lin, B.J., "Phase-Shifting Masks Gain An Edge", IEEE Circuits & Devices, pp. 28-35, Mar. 1993. cited by other .
Liu, H.Y. et al., "Fabrication of 0.1 .mu.m T-Shaped Gates By Phase-Shifting Optical Lithography", SPIE, Optical/Laser Microlithography VI, vol. 1927, pp. 42-52 (1993). cited by other .
Matsuoka, K. et al., "Application Of Alternating Phase-Shifting Mask To 0.16 .mu.m CMOS Logic Gate Patterns", Matsushita Electric Ind. Co., Ltd. (9 pages), date unknown. cited by other .
Mizuno, F. et al., "Practical Phase-Shifting Mask Technology For 0.3 .mu.m Large Scale Integrations", J. Vac. Sci. Technol. B, vol. 12, No. 6, pp. 3799-3803, Nov./Dec. 1994. cited by other .
Morimoto, H. et al., "Next Generation Mask Strategy--Technologies Are Ready For Mass Production Of 256MDRAM?", SPIE, vol. 3236, pp. 188-189 (1997). cited by other .
Neureuther, A., "Modeling Phase Shifting Masks", SPIE, 10.sup.th Annual Symposium on Microlithography, vol. 1496, pp. 80-85 (1990). cited by other .
Nistler, J. et al., "Large Area Optical Design Rule Checker For Logic PSM Application", SPIE, Photomask and X-Ray Mask Technology, vol. 2254, pp. 78-92 (1994). cited by other .
Nistler, J. et al., "Phase Shift Mask Defect Printability Analysis", Proceedings of the Microlithography Seminar Interface '93, OCG Microelectronic Materials, Inc., pp. 11-28 (1993). cited by other .
Ohtsuka, H. et al., "Phase Defect Repair Method For Alternating Phase Shift Masks Conjugate Twin-Shifter Method", Jpn. J. Appl. Phys., vol. 31, pp. 4143-4149 (1992). cited by other .
Pati, Y.C. et al., "Phase-Shifting Masks For Microlithography: Automated Design And Mask Requirements", J. Opt. Soc. Am., vol. 11, No. 9, pp. 2438-2452, Sep. 1994. cited by other .
Pierrat, C. et al., "A Rule-Based Approach To E-Beam And Process-Induced Proximity Effect Correction For Phase-Shifting Mask Fabrication", SPIE, vol. 2194, pp. 298-309 (1994). cited by other .
Pierrat, C. et al., "Phase-Shifting Mask Topography Effects On Lithographic Image Quality", IEEE, pp. 3.3.1-3.3.4 (1992). cited by other .
Rieger, M. et al., "System For Lithography Proximity Compensation", Precim Company, Portland, Oregon, Sep. 1993 (28 pages). cited by other .
Roman, B. et al., "Implications Of Device Processing On Photomask CD Requirements", SPIE, vol. 3236 (1997) (Abstract Only). cited by other .
Spence, C. et al., "Automated Determination Of CAD Layout Failures Through Focus: Experiment And Simulation", SPIE, vol. 2197, pp. 302-313 (1994). cited by other .
Spence, C. et al., "Detection Of 60.degree. Phase Defects On Alternating PSMs", Advance Micro Devices, KLA-Tencor, DuPont RTC (2 pages), date unknown. cited by other .
Spence, C. et al., "Integration Of Optical Proximity Correction Strategies In Strong Phase Shifters Design For Poly-Gate Layers", Bacus News, vol. 15, Issue 12, pp. 1, 4-13, Dec. 1999. cited by other .
Stirniman, J. et al., "Wafer Proximity Correction And Its Impact On Mask-Making", Bacus News, vol. 10, Issue 1, pp. 1, 3-7, 10-12, Jan. 1994. cited by other .
Sugawara, M. et al., "Defect Printability Study Of Attenuated Phase-Shifting Masks For Specifying Inspection Sensitivity"; Semiconductor Company, Sony Corporation, Kanagawa, Japan (16 pages), date unknown. cited by other .
Terasawa, T. et al., "0.3-Micron Optical Lithography Using A Phase-Shifting Mask", SPIE, Optical/Laser Microlithography II, vol. 1088, pp. 25-33, Mar. 1989. cited by other .
Watanabe, H. et al., "Detection And Printability Of Shifter Defects In Phase-Shifting Masks II Defocus Characteristics", Jpn. J. Appl. Phys., vol. 31, pp. 4155-4160 (1992). cited by other .
Wiley, J. et al., "Phase Shift Mask Pattern Accuracy Requirements And Inspection Technology", SPIE, Integrated Circuit Metrology, Inspection, and Process Control V, vol. 1464, pp. 346-355 (1991). cited by other .
Sakata, Miwa, et al., "A Novel Radiaion Sensitive Spin-on-glass Convertible into SiO2 and the Simple Fabrication Process Using It," Jul. 26, 1993* (*ATI Bell Labs fax date), 3 pages. cited by other .
Pistor, Thomas V., "Rigorous 3D Simulation of Phase Defects in Alternating Phase-Shifting Masks," Proceedings of SPIE 4562-1038 (Mar. 2002), 13 pages. cited by other .
Ogawa, Kiyoshi, et al., "Phase Defect Inspection by Differential Interference," Proceedings of SPIE 4409-71, Apr. 26, 2001, 12 pages. cited by other .
Rhyins, P., et al., "Characterization of Quartz Etched PSM Masks for KrF Lithography at the 100 nm node," Proceedings of SPIE 4562 (Mar. 2002), 486-495. cited by other .
Sewell, Harry, et al., "An Evaluation of the Dual Exposure Technique," (As early as 2002*), 11 pages *The date is based on references 8&9 of the article of Feb. 16, 2001 and Feb. 27, 2002, respectively. cited by other .
Wang, Ruoping, et al., "Polarized Phase Shift Mask: Concept, Design, and Potential Advantages to Photolithography Process and Physical Design," Proceedings of SPIE 4754-105, Apr. 25, 2002, 12 pages. cited by other .
Matsuoka, et al., "Application of Alternating Phase-Shifting Mask to 0.16um CMOS Logic Gate Patterns," SPIE Proc. 3051, Mar. 10-14, 1997, 10 pages. cited by other .
Semmier, Armin, et al., "Application of 3D EMF Simulation for Development and Optimization of Alternating Phase Shifting Masks," Proc. of SPIE 4346-37, Mar. 1, 2001, 12 pages. cited by other .
Wong, Alfred K., "Polarization Effects in Mask Transmission," Proc. of SPIE 1674, Mar. 8, 1992, 8 pages. cited by other .
Ackmann, Paul, et al., "Phase Shifting and Optical Proximity Corrections to improve CD control on Logic Devices in Manufacturing for sub 0.35 um I-Line," Proc. of SPIE 3051-07, Mar. 1997, 8 pages. cited by other .
Spence, C., et al., "Detection of 60 degree Phase defects on Alternating PSMs," Proc. of SPIE 3412-73, Apr. 1998, 2 pages. cited by other .
Sugawara, Minoru, et al., "Defect printability study of attenuated phase-shifting masks for specifying inspection sensitivity," Proc. SPIE 2621-49, Sep. 1995, 16 pages. cited by other .
Schmidt, Regina, et al., "Impact of Coma on CD Control for Multiphase PSM Designs," Proc. SPIE 3334-02, Feb. 1998, 11 pages. cited by other .
Erdmann, Andreas, "Topography effects and wave aberrations in advanced PSM-technology," Proc. SPIE 4346-36, Mar. 1, 2001, 28 pages. cited by other .
Granik, Yuri et al., "CD variation analysis technique and its application to the study of PSM mask misalignment," Proc. SPIE 4186-94, Sep. 2000, 9 pages. cited by other .
Ishiwata, Naoyuki, et al., "Fabrication of Phase-Shifting Mask," Proc. SPIE 1463, Mar. 1991, 11 pages. cited by other .
Levenson, Marc D., et al., "Phase Phirst! An improved strong-PSM paradigm," Proc. SPIE 4186-42, Sep. 2000, 10 pages. cited by other .
Levenson, Marc. D., et al., "SCAA mask exposures and Phase Phirst design for 110nm and below," Proc. SPIE 4346-817, Sep. 2001, 10 pages. cited by other .
Morikawa, Yasutaka, et al., "100nm-Alt.PSM structure discussion for ArF lithography," Proc. SPIE 4409-22, Apr. 2001, 15 pages. cited by other .
Ozaki, T., et al., "A 0.15um KrF Lithography for 1Gb DRAM Product using Highly Printable Patterns and Thin Resist Process," 1998 Symposium on VLSI Technology, Jun. 1998, Honolulu, Hawaii, 2 pages. cited by other .
Ronse, Kurt, et al., "Comparison of various phase shift strategies and application to 0.35 um ASIC designs," Proc. SPIE 1927, 1993, 15 pages. cited by other .
Rosenbluth, Alan E., et al., "Optimum Mask and Source Patterns to Print a Given Shape," Proc. SPIE 4346-49, Mar. 1, 2001, 17 pages. cited by other .
Suzuki, Akiyoshi, et al., "Multilevel imaging system realizing k1=0.3 lithography," Proc. SPIE 3679-36, Mar. 1999, 13 pages. cited by other .
Vandenberghe, G., et al., "(Sub-) 100nm gate patterning using 248nm alternating PSM," Mentor Graphics White Paper, May 2001, 9 pages. cited by other .
Fritze, M., et al., "100-nm Node Lithography With KrF?" Feb. 1, 2001, 14 pages. cited by other .
Fukuda, Hiroshi, et al., "Patterning of Random Interconnect Using Double Exposure of Strong-Type PSMs," Proc. SPIE 4346-695, Sep. 2001, 8 pages. cited by other .
Ferguson, Richard A., et al., "Pattern-Dependent Correction of Mask Topography Effects for Alternating Phase-Shifting Masks," Proc. SPIE 2440-349, May 1995, 12 pages. cited by other .
Toublan, Olivier, et al., "Phase and Transmission Errors Aware OPC Solution for PSM: Feasibility Demonstration," Proc. SPIE 4186-95, Sep. 13, 2000, 7 pages. cited by other .
Yanagishita, Yuichiro, et al., "Phase-Shifting Photolithography Applicable to Real IC Patterns," Proc. SPIE 1463, Mar. 3, 1991, 11 pages. cited by other .
Pierrat, C., "Investigation of Proximity Effects in Alternating Aperture Phase Shifting Masks," Sep. 2000, 11 pages. cited by other .
Cote, Michel, et al., "A Practical Application of Full-Feature Alternating Phase-Shifting Technology for a Phase-Aware Standard-Cell Design Flow," Jun. 1, 2001, 6 pages. cited by other .
Hanyu, Isamu, et al., "New phase-shifting mask with highly transparent SiO2 phase shifters," Proc. SPIE 1264-167, Jun. 1990, pp. 166-177. cited by other .
McCallum, Martin, et al., "Alternating PSM Mask Performance--A Study of Multiple Fabrication Technique Results," Proc. SPIE 4346-723, Sep. 2001, 6 pages. cited by other .
International Search Report dated Apr. 14, 2008 from corresponding International App. No. PCT/US02/17668. cited by other.

Primary Examiner: Rosasco; Stephen
Attorney, Agent or Firm: Suzue; Kenta Haynes Beffel & Wolfeld LLP

Parent Case Text



RELATED APPLICATIONS

This application is a divisional of U.S. application Ser. No. 10/809,650 filed 26 Mar. 2004, now U.S. Pat. No. 6,861,204 entitled "Design and Layout of Phase Shifting Photolithographic Masks," having inventors Christophe Pierrat and Michel Cote and assigned to the assignee of the present invention, which application is a divisional of U.S. application Ser. No. 10/085,759, filed 28 Feb. 2002, now U.S. Pat. No. 6,787,271 entitled "Design and Layout of Phase Shifting Photolithographic Masks," having inventors Christophe Pierrat and Michel Cote and assigned to the assignee of the present invention, which application is a continuation-in-part of, and incorporates by reference, U.S. patent application Ser. No. 09/669,359 filed 26 Sep. 2000 now U.S. Pat No. 6,503,666 entitled "Phase Shift Masking for Complex Patterns" having inventor Christophe Pierrat and assigned to the assignee of the present invention, which is a non-provisional of U.S. Provisional Patent Application Ser. No. 60/215,938 filed 5 Jul. 2000 entitled "Phase Shift Masking For Complex Layouts" having inventor Christophe Pierrat and assigned to the assignee of the present invention.

This application is a divisional of U.S. application Ser. No. 10/809,650 filed 26 Mar. 2004, entitled "Design and Layout of Phase Shifting Photolithographic Masks," having inventors Christophe Pierrat and Michel Cote and assigned to the assignee of the present invention, which application is a divisional of U.S. application Ser. No. 10/085,759, filed 28 Feb. 2002, now U.S. Pat. No. 6,787,271 entitled "Design and Layout of Phase Shifting Photolithographic Masks," having inventors Christophe Pierrat and Michel Cote and assigned to the assignee of the present invention, which application is related to, claims the benefit of priority of, and incorporates by reference, the U.S. Provisional Patent Application Ser. No. 60/296,788 filed 8 Jun. 2001 entitled "Phase Conflict Resolution for Photolithographic Masks" having inventors Christophe Pierrat and Michel Cote and assigned to the assignee of the present invention.

This application is a divisional of U.S. application Ser. No. 10/809,650 filed 26 Mar. 2004, entitled "Design and Layout of Phase Shifting Photolithographic Masks," having inventors Christophe Pierrat and Michel Cote and assigned to the assignee of the present invention, which application is a divisional of U.S. application Ser. No. 10/085,759, filed 28 Feb. 2002, now U.S. Pat. No. 6,787,271 entitled "Design and Layout of Phase Shifting Photolithographic Masks," having inventors Christophe Pierrat and Michel Cot


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