Title: Electromagnetic field superimposed lens and electron beam device using this electromagnetic field superimposed lens
Abstract: A magnetic pole of a magnetic field type lens is divided into a first magnetic pole section that is at ground potential, and a second magnetic pole section facing a sample and to which a negative high voltage is applied, the first magnetic pole section and the second magnetic pole section 212 being electrically insulated from each other, and an electric field type bi-potential lens is made up of an electrode attached to the first magnetic pole section so as to surround an electron beam path. High resolution observation with small chromatic aberration factor Cs, Cc is made possible without forming a positive high voltage section inside an electron beam path of a lens barrel.
Patent Number: 6,897,450 Issued on 05/24/2005 to Yonezawa
| Inventors:
|
Yonezawa; Akira (Chiba, JP)
|
| Assignee:
|
SII NanoTechnology Inc. (Chiba, JP)
|
| Appl. No.:
|
978258 |
| Filed:
|
October 15, 2001 |
Foreign Application Priority Data
| Oct 20, 2000[JP] | 2000-321321 |
| Current U.S. Class: |
250/396R; 250/396ML |
| Intern'l Class: |
H01J 037/20 |
| Field of Search: |
250/396 R,396. ML,310
|
References Cited [Referenced By]
U.S. Patent Documents
Primary Examiner: Nguyen; Kiet T.
Attorney, Agent or Firm: Adams & Wilks
Claims
1. An electromagnetic field superimposed lens having an electrical field bi-potential
lens accommodated within a magnetic field lens, wherein:
a magnetic pole of the magnetic field lens is divided into a first magnetic pole
section to which an earth potential is applied during use, and a second magnetic
pole section facing a sample, a negative potential being applied to the second
magnetic pole and to the sample during use, and the first and second magnetic pole
sections being electrically insulated from each other; and
the electric field bi-potential lens comprises an electrode connected to the
first magnetic pole section so as to surround an electron beam path of the superimposed
lens, and the second magnetic pole section.
2. An electromagnetic field superimposed lens according to claim 1; further comprising
an electrically insulating member disposed between confronting ends of the first
and second electromagnetic pole sections such that the first and second electromagnetic
pole sections and the electrically insulating member form an integral body.
3. An electromagnetic field superimposed lens according to claim 2; further comprising
an excitation coil attached to an overhang portion of the first electromagnetic
pole section extending radially from the electron beam path; wherein the second
magnetic pole section extends from the electrically insulating member towards the
sample and becomes narrower in cross-sectional diameter as it approaches the sample,
and a magnetic gap is formed between ends of the first and second magnetic pole
sections closest to the sample.
4. An electromagnetic field superimposed lens according to claim 3; wherein a
magnetic pole of the superimposed lens is formed on a sample side of the second
magnetic pole section.
5. An electron beam device having the electromagnetic field superimposed lens
according to claim 1.
6. An electromagnetic field superimposed lens having an electrical field bi-potential
lens accommodated within a magnetic field lens: wherein
a magnetic pole of the magnetic field lens is divided into a first magnetic pole
section to which an earth potential is applied during use, and a second magnetic
pole section facing a sample, a negative potential being applied to the second
magnetic pole section and to the sample during use, and the first and second magnetic
pole sections being electrically insulated from each other; and
the electrical field bi-potential lens comprises a high resistance body provided
between the first magnetic pole section and the second magnetic pole section so
as to surround an electron beam path of the superimposed lens, such that a potential
difference exists between the first magnetic pole section and the second magnetic
pole section.
7. An electromagnetic field superimposed lens according to claim 6; further comprising
an electrically insulating member disposed between confronting ends of the first
and second electromagnetic pole sections such that the first and second electromagnetic
pole sections and the electrically insulating member form an integral body.
8. An electromagnetic field superimposed lens according to claim 7; further comprising
an excitation coil attached to an overhang portion of the first electromagnetic
pole section extending radially from the electron beam path; wherein the second
magnetic pole section extends from the electrically insulating member towards the
sample and becomes narrower in cross-sectional diameter as it approaches the sample,
and a magnetic gap is formed between ends of the first and second magnetic pole
sections closest to the sample.
9. An electron beam device having the electromagnetic field superimposed lens
according to claim 6.
10. A composite electromagnetic field lens, comprising: a magnetic field lens
for producing a magnetic focusing field for focusing an electron beam along an
optical axis, the magnetic field lens comprising a first magnetic pole section
surrounding the optical axis and having an overhang portion extending radially
outward from the optical axis, an excitation coil disposed in the overhang portion,
and a second magnetic pole section extending from a location near the overhang
portion toward a sample to be irradiated with the focused electron beam; and an
electric field lens accommodated within the magnetic field lens for superimposing
a decelerating electric field onto the magnetic focusing field to reduce an aberration
factor of the lens, the electric field lens comprising a high resistance body surrounding
the optical axis arid electrically connecting the first and second magnetic pole sections.
11. A composite lens according to claim 10; further comprising a voltage source
for applying a negative potential to the second magnetic pole section and the sample
and applying a ground potential to the first magnetic pole section.
12. A composite lens according to claim 10; wherein a magnetic gap is formed
between the tip of the second pole section and an end of the first pole section
opposite the overhang section so that the focusing magnetic field is generated
in the magnetic gap upon application of an electric current to the excitation coil.
13. A composite lens according to claim 10; wherein the second pole section has
a conical shape with a tip facing the sample.
14. A composite electromagnetic field lens, comprising: a magnetic field lens
for producing a magnetic focusing field for focusing an electron beam along an
optical axis, the magnetic field lens comprising a first magnetic pole section
surrounding the optical axis and having an overhang portion extending radially
outward from the optical axis, an excitation coil disposed in the overhang portion,
and a second magnetic pole section extending from a location near the overhang
portion toward a sample to be irradiated with the focused electron beam; and an
electric field lens accommodated within the magnetic field lens for superimposing
a decelerating electric field onto the magnetic focusing field to reduce an aberration
factor of the lens, the electric field lens having an electrode formed of a non-magnetic
conductive material, the electrode having an outer diameter corresponding to an
inner diameter of the first pole section so that a first end of the electrode is
received in the first pole section and is electrically connected thereto.
15. A composite lens according to claim 14; wherein a second end of the electrode
faces the tip of the second magnetic pole section with a predetermined distance therebetween.
16. A composite electromagnetic field lens, comprising: a magnetic field lens
for producing a magnetic focusing field for focusing an electron beam along an
optical axis, the magnetic field lens comprising a first magnetic pole section
surrounding the optical axis and having an overhang portion extending radially
outward from the optical axis, an excitation coil disposed in the overhang portion,
a second magnetic pole section extending from the overhang portion toward a sample
to be irradiated with the focused electron beam, and a voltage source for applying
a negative potential to the second magnetic pole section and the sample and applying
a ground potential to the first magnetic pole section during use of the magnetic
field lens; and an electric field lens accommodated within the magnetic field lens
for superimposing a decelerating electric field onto the magnetic focusing field
to reduce an aberration factor of the lens, the electric field lens comprising
a high resistance body surrounding the optical axis and electrically connecting
the first and second magnetic pole sections.
17. A composite electromagnetic field lens according to claim 16; further comprising
an electrically insulating member disposed between the overhang section and the
second magnetic pole section.
18. A composite electromagnetic field lens according to claim 16; wherein a magnetic
gap is formed between the tip of the second pole section and an end of the first
pole section opposite the overhang section so that the focusing magnetic field
is generated in the magnetic gap upon application of an electric current to the
excitation coil.
19. A composite electromagnetic field lens according to claim 16; wherein the
second pole section has a conical shape with a tip facing the sample.
Description
BACKGROUND OF THE INVENTION
1. Technical Field
The present invention relates to an electromagnetic field superimposed lens for
an electron beam device capable of high resolution observation, and to an electron
beam device using this electromagnetic field superimposed lens.
2. Related Art
In order to perform inspection or observation of the shape of a fine pattern
using
an electron beam device, various electron beam devices such as a scanning electron
microscope have conventionally been used, and in particular, there has been a high
demand for high resolution observation accompanying the fact that electron beam
devices have become ultra fine in recent years. As an electromagnetic lens enabling
high resolution observation, Japanese patent laid open No. Hei. 6-24106 disclosed
a structure where a decelerating electrical field is caused to overlap a lens magnetic
field, reducing the spherical aberration factor Cs and chromatic aberration factor Cc.
As shown in FIG. 5, this electromagnetic field superimposed lens is formed from
a bi-potential lens (electrostatic immersion lens) comprising a magnetic field
lens ML, an electrode RE, and a lower magnetic pole UP, and has a structure where
a magnetic field is generated in a space containing a pole piece gap PS if electric
current flows in a coil SP. A cylindrical electrode RE is provided coaxially with
an optical axis OA inside an upper pole piece OP via an insulator IS. A decelerating
electric field is formed across the electrode RE by applying a positive potential
to the electrode RE and keeping a lower pole piece UP at ground potential. A lens
having small spherical aberration factor Cs and chromatic aberration factor Cc
is obtained from the action of superimposing a magnetic field occurring across
the pole piece gap PS and the decelerating electric field.
However, with the above described electromagnetic field superimposed lens,
there is a problem in that the device structure becomes complicated and it is easy
for damage to occur. Specifically, since a sample and a lens electrode facing the
sample are held at ground potential, in causing superimposing of a decelerating
electrical field having the effect of decreasing aberration factor on a magnetic
field, a positive high potential must be formed inside the lens barrel, but with
the structure shown in FIG. 5 a positive high potential +9 kV is applied to the
electrode RE and an electrode gun anode.
Although not shown in FIG. 5, in an actual lens barrel a vacuum tube, a
collimating lens, a deflector, an air lock valve and a movable aperture are arranged
between an electron beam generator and an objective lens. Accordingly, when a high
voltage is applied to each of these elements, as described above, measures, such
as providing an optical system, are required to cope with this. Further, problems
arise such as damage and electron beam charging due to electrical discharge from
the high voltage sections, and it is easy for disadvantages such as cost increase,
and increase in the frequency of maintenance to occur to a significant increase
in the number of components. There is proposed a structure where midway along the
inside of lens barrel, the potential falls from a high potential to ground potential
with advancement of an electron beam and a high potential is applied again to the
electrode RE, but it becomes necessary to take into consideration a lens operation
at voltage varying sections, and there is a separate problem that an electron optical
system is made complicated.
SUMMARY OF THE INVENTION
An object of the present invention is to provide an electromagnetic field superimposed
lens and an electron beam device using this electromagnetic field superimposed
lens that can solve the problems described above that exist in the related art.
Another object of the present invention is to provide an electromagnetic
field superimposed lens and an electron beam device using this electromagnetic
field superimposed lens that can solve the problems described above that exist
in the related art and which results in simplification of the structure, and particularly
enables stable and high resolution observation with a low acceleration sample irradiation voltage.
In order to solve the above described problems, according to the present invention
there is proposed an electromagnetic field superimposed lens, having an electrical
field bi-potential lens provided in a magnetic field lens, wherein a magnetic pole
of the magnetic field lens is divided into a first magnetic pole section at an
earth potential, and a second magnetic pole section, facing a sample, to which
a negative potential is applied, as well as to the sample, the two magnetic pole
sections being electrically insulated from each other, and the electric field bi-potential
lens is made up of an electrode connected to the first magnetic pole section so
as to surround an electron beam path, and the second magnetic pole section.
It is also possible for the electromagnetic pole to be formed by making one end
of the first electromagnetic pole section and one end of the second magnetic pole
section integral via an electrically insulating member.
It is also possible for an excitation coil to be attached to the first electromagnetic
pole section, with another end of the second magnetic pole section extending getting
narrower towards the sample, to form a magnetic gap between the other end of the
first magnetic pole section and the other end of the second magnetic pole section.
Also, according to the present invention there is proposed an electromagnetic
field superimposed lens, having an electrical field bi-potential lens provided
in a magnetic field lens, wherein a magnetic pole of the magnetic field lens is
divided into a first magnetic pole section at an earth potential, and a second
magnetic pole section, facing a sample, to which a negative potential is applied,
as well as to the sample, the two magnetic pole sections being electrically insulated
from each other, and the electrical field bi-potential lens is comprised of a high
resistance body provided between the first magnetic pole section and the second
magnetic pole section so as to surround an electron beam path, so as to apply a
potential difference between the first magnetic pole section and the second magnetic
pole section.
It is also possible for the electromagnetic pole to be formed by making one end
of the first electromagnetic pole section and one end of the second magnetic pole
section integral via an electrically insulating member.
It is also possible for an excitation coil to be attached to the first electromagnetic
pole section, with another end of the second magnetic pole section extending getting
narrower towards the sample, to form a magnetic gap between the other end of the
first magnetic pole section and the other end of the second magnetic pole section.
According to the present invention, there is also proposed an electron
beam device using any one of the above described electromagnetic field superimposed lenses.
BRIEF DESCRIPTION OF THE DRAWINGS
FIG. 1 is a cross sectional drawing showing one example of an embodiment of
an electromagnetic field superimposed lens of the present invention.
FIG. 2A is a graph showing potential distribution and magnetic field distribution
for the electromagnetic field superimposed lens of the present invention.
FIG. 2B is a graph showing potential distribution and magnetic field distribution
for the electromagnetic field superimposed lens of the related art shown in FIG. 5.
FIG. 3 is a graph showing calculation values for chromatic aberration factor
characteristics in the electromagnetic field superimposed lens shown in FIG. 1.
FIG. 4 is a cross sectional drawing showing another embodiment of an electromagnetic
field superimposed lens of the present invention.
FIG. 5 is a cross sectional drawing of an electromagnetic field superimposed
lens of the related art.
DESCRIPTION OF THE PREFERRED EMBODIMENTS
The following is a detailed description, with reference to the drawings, of an
example of an embodiment of the present invention.
FIG. 1 is a cross sectional drawing showing one example of an embodiment of
an electromagnetic field superimposed lens of the present invention. The electromagnetic
field superimposed lens
1 (or compound lens) is constructed as an objective
lens for an electron beam device such as a scanning electron microscope used to
examine or observe the shape of a micro-electronic device, and is an electrostatic
collimating lens having a structure where an electrical field type bi-potential
lens
3 built in to a magnetic field type lens
2, a magnetic focusing
action is imparted to an electronic beam penetrating along an optical axis X due
to the magnetic field type lens
2, and at the same time a decelerating electrical
field due to the electrical field type bi-potential lens
3 is superimposed
on the magnetic field to reduce an aberration factor of the lens, so as to enable
high resolution observation.
The magnetic field lens
2 has an excitation coil
22 provided in
the magnetic pole
21. The magnetic pole has a first magnetic pole section
211 and a second magnetic pole section
212, with the first magnetic
pole section
211 and the second magnetic pole section
212 being made
integral via an insulating body
213 formed from an electrically insulating
material. The first magnetic pole section
211 is provided on a penetration
side of the electron beam that penetrates along the optical axis X, and an overhanging
section
211B having an L-shaped cross section extends in a radially outward
direction integrally with one end edge
211Aa of a cylindrical main section
211A forming a cylindrical passage Y allowing passage of the electron beam.
The excitation coil
22 is housed in an annular space enclosed by the main
section
211A and the overhanging section
211B.
On the other hand, the second magnetic pole
212 is formed substantially
in a bowl or conical shape, with a large diameter opening edge section
212A,
begin one end of the second magnetic pole section
212, being fixed to a
tip section
211Ba of the overhanging section
211B via the insulating
body
213. The insulating body
213 is an annular body corresponding
to the size and shape of the other end edge
211Ab and the main section
211A,
and the overhanging section
211B is integral with the second magnetic pole
section
212 via the insulating body
213. The tip section
212B
of the second magnetic pole section
212 faces the other end edge
211Ab
of the main section
211A with a specified distance between them, and in
this way magnetic gap G is formed. A passage hole
212C for allowing passage
of the electron beam is provided in the tip section
212B, coaxially with
the optical axis X.
Since the magnetic lens
2 has the above described structure, if electric
current flows in the excitation coil
22 an extremely strong magnetic field
is generated in the magnetic gap G, and it is thus possible to form a focusing
magnetic field inside the passage Y. Accordingly, an electron beam from an electron
gun (not shown), going along the optical axis X and penetrating the electromagnetic
field superimposed lens
1 is subjected to a focusing operation by this magnetic
field when it passes through the passage Y.
One electrode of the electric field type bi-potential lens is formed from a non-magnetic
conductive material, and is provided with a cylindrical electrode
31 having
an outer diameter set to a value that corresponds to the inner diameter of the
main section
211A. One end section
31A of the electrode
31
is inserted into the other end edge
211Ab of the main section
211A,
as shown in the drawing, and the electrode
31 is fixed to the magnetic pole
21 so as to be electrically connected to the first magnetic pole section
211. The other end edge
31B of the electrode
31 faces the
tip end
212B of the second magnetic pole section
212 with a specified
distance between them both.
The magnetic pole
21 is grounded, and a negative voltage VL (for example,
-1 kV) is applied to the second magnetic pole section
212 using a battery
4. Accordingly, a decelerating electrical field arises between the electrode
31 and the tip section
212B, and in this way an electromagnetic field
superimposed lens capable of superimposing the decelerating electrical field on
the magnetic field having the focusing action due to the magnetic type lens
2
is formed. As will be understood from the above description, the electrode
31
and the tip section
212B function as a pair of electrodes of the electrical
field type bi-potential lens
3, forming a bi-potential lens.
The ground potential section of the electromagnetic field superimposed lens
1
is connected to a ground potential sample chamber (not shown), while the second
magnetic pole section
212 and the sample
5 to which the negative
voltage is applied are positioned inside the sample chamber that held in a vacuum.
The electron beam generated from the electron gun (not shown) and incident along
the optical axis X is subjected a converging action due to the magnetic field generated
in the magnetic gap G of the magnetic field type lens
2 and also to the
action of a decelerating electrical field generated by the electrical field type
bi-potential lens
3, and converged on the sample
5, and at the same
time the electron beam is scanned on an observation surface of the sample
5
by a scanning deflector (not shown). Secondary electrons produced from the sample
5 are detected by a secondary electron detector
6 placed transverse
to the electromagnetic field superimposed lens
1, or by a secondary electron
detector
7 placed above the lens. Since the negative potential VL applied
to the second magnetic pole section
212 directly constitutes the negative
voltage VS applied to sample
5, no disturbance is produced in an electrical
field by tilting of the sample
5, enabling high resolution observation even
if the sample is titled to a large tilt angle.
FIG. 2A shows potential distribution and magnetic field distribution for the
electromagnetic field superimposed lens
1 shown in FIG.
1. An electron
beam from the electron gun cathode (potential Ug, for example 2 kV) is accelerated
between the electron gun cathode and electron gun anode (potential: ground), and
scanned inside the ground potential lens barrel at an energy Ug (:2 kV). After
that, in the electromagnetic field superimposed lens
1, there is a magnetic
field focusing action due to the magnetic field type lens
2, as well as
the action of a decelerating electrical field due to the electrical field type
bi-potential lens
3 superimposed on the magnetic field, and the electron
beam is irradiated on the sample
5 (potential VS, for example, -1 kV) to
which the negative potential is applied at an energy of VS-Ug (: 1 kv). Accordingly,
the aberration factor of the lens is reduced by the action of the magnetic field
and the decelerating electrical field superimposed on the magnetic field.
For comparison, FIG. 2B schematically shows potential distribution and magnetic
field distribution for the related art example shown in FIG.
5. An electron
beam from the cathode (potential Ug, for example 1 kV) is accelerated between the
cathode and the positively applied electron gun anode (potential: Va, for example
+1 kV), and scanned inside the positive potential Va lens barrel at an energy Va-Ug
(:2 kV). In the electromagnetic field superimposed lens, there is a magnetic field
focusing action, as well as the action of a decelerating electrical field superimposed
on the magnetic field, and the electron beam is irradiated on the ground potential
sample (potential
0) at an energy of 0-Ug (: 1 kV). The aberration factor
of the lens is reduced by the action of the magnetic field and the decelerating
electrical field superimposed on the magnetic field. With the electromagnetic field
superimposed lens
1 of the present invention, the lens barrel potential
is ground potential except for at the electron gun section and electromagnetic
field superimposed lens section, while with the related art example shown in FIG.
5 Va of a positive potential is applied.
FIG. 3 shows examples of calculated values for Wd (:distance from top face of
second magnetic pole section
212 to sample
5) of chromatic aberration
factor Cc that is predominant in image resolution for reduced acceleration voltage,
in the electromagnetic field superimposed lens
1 shown in FIG.
1.
Electron orbit is obtained for the place where the electrical field and magnetic
field are superimposed, and the chromatic aberration factor Cc is calculated using
a well known integration formula. The curved line (a) represents chromatic aberration
factor Cc for the case when VL=VS=0, namely when potential is not applied to the
second magnetic pole section
212 and the sample
5 (namely, for the
lens used in the related art where the electrical field is not superimposed), the
curved line (b) represents chromatic aberration factor for VL=VS=-1 kV, the curved
line (c) represents chromatic aberration factor for VL=VS=-2 kV, and the curved
line (d) represents chromatic aberration factor for VL=VS=-4 kV. In all cases,
the energy of an electron beam irradiated on the sample is 1 kV. For example, in
the case of VL=VS=-2 kV, the electron gun potential vg is set at -3 kv, and the
electron beam is irradiated on the sample at an energy of VS-Ug. It will be understood
that by superimposing the decelerating electrical field and the magnetic field
the chromatic aberration factor is reduced, improving image resolution.
Even if the electrode
31 is eliminated and similarly the potential is
applied to the second magnetic pole section
212 and the sample
5,
the chromatic aberration factor Cc is reduced, but the reduction effect is slighter.
As will be understood from the above description, according to the electromagnetic
field superimposed lens
1 it is possible to make chromatic aberration factor
Cs, CC smaller, and as well as enabling high resolution observation, since it is
possible to apply a negative high potential only to the second magnetic pole section
212 at the end of the lens barrel and to the sample
5 without forming
a positive high potential section inside an electron beam passage of the lens barrel,
it is possible to make it difficult for high voltage electric discharge to occur
compared to the related art example where a positive high potential section extends
over a comparatively wide range of the electron beam passage, which significantly
improves maintainability and cost reduction compared to the structure of the related
art shown in FIG.
5. The sample
5 is electrically insulated from
the sample drive mechanism by an insulating member, which means that application
of the negative high potential is easy.
As a result, as well as simplifying the structure of the electromagnetic field
superimposed lens
1 and improving maintainability, in particular it is possible
to realize an electromagnetic field superimposed lens and an electron beam device
using this electromagnetic field superimposed lens that is stable and has high
resolution with respect to a low acceleration sample irradiation voltage.
FIG. 4 shows another embodiment of the present invention. The electromagnetic
field superimposed lens
1′ shown in FIG. 4 is constructed with a
high resistance body R built into the magnetic field type lens
2, and is
only different from the electromagnetic field superimposed lens
1 shown
in FIG. 1 in that the electrical field type bi-potential lens in FIG. 1 is replaced
with the high resistance body R. Accordingly, the same numerals are used for the
sections in FIG. 4, that correspond to those in FIG. 1, and the descriptions for
those sections are omitted.
The high resistance body R is a cylindrical member similar to the electrode
31,
and is constructed using a well known high resistance pipe or the like. One end
RA of the high resistance body R is inserted into an inner side of the other end
211Ab and fixed so as to be coaxial with the optical axis X, and in this
way, the end RA is electrically connected to the first magnetic pole section
211.
On the other hand, the other end RB of the high resistance body R extends to the
tip section
212B and is electrically connected to the second magnetic pole
section
212.
In this way, the high resistance body R electrically connects between the first
magnetic pole section
211 and the second magnetic pole section
212,
which means that a potential gradient arises in the high resistance body R when
a potential is applied across the first magnetic pole section
211 and the
second magnetic pole section
212, and this makes it possible to form a decelerating
electrical field for gradually switching over from the ground potential of the
first magnetic pole section
211 to the negative high potential of the second
magnetic pole section
212. With the electromagnetic field superimposed lens
1 shown in FIG. 1, if the gap between the electrode
31 and the second
magnetic pole section
212 is made small for the purpose of reducing the
chromatic aberration factor Cc there is a problem that it becomes easy for electrical
discharge to occur, but with the structure of the electromagnetic field superimposed
lens
11 shown in FIG. 4, this problem is solved.
With the embodiments described above, the electrode
31 or the electron
beam side end surface of the high resistance body are at ground potential, but
it is also possible to partially apply a positive potential having such a magnitude
that its effect on the focusing of the electron beam can be ignored. For example,
with the electromagnetic field superimposed lens
1 of FIG. 1, in the case
where Ug=3 kV, it is possible to apply a potential of around 1 kV to the electrode
31 through the insulator. in this way it is possible to increase the deceleration
effect with the negative high potential.
According to the present invention, in addition to the advantage that chromatic
aberration factor Cs, Cc, being a characteristic of an electromagnetic field superimposed
lens
1 is made small, and enabling high resolution observation, since there
is a structure where a negative high potential is applied to the second magnetic
pole section at the end of the lens barrel without forming a positive high potential
section inside an electron beam passage of the lens barrel, it is possible to make
it difficult for high voltage electric discharge to occur compared to the related
art example where a positive high potential section extends over a comparatively
wide range of the electron beam passage, making it possible to improve maintainability
and reduce cost. As a result, stable high resolution observation is enabled with
particularly low acceleration sample irradiation voltage.
Also, with the structure such that the high resistance body is electrically
connected between the first magnetic pole section and the second magnetic pole
section, causing a potential gradient to arise in the high resistance body when
a potential is applied across the first magnetic pole section and the second magnetic
pole section, making it possible to form a decelerating electrical field for gradually
switching over from the ground potential of the first magnetic pole section to
the negative high potential of the second magnetic pole section, the problem where
it is easy for electrical discharge to occur when the gap between the electrode
and the second magnetic pole section is reduced for the purpose of reducing chromatic
aberration factor of the electromagnetic field superimposed lens with the example
invention of FIG. 1 can be avoided, and exceptional effects of reducing the chromatic
aberration factor can be expected.
*
